Mo Polycrystalline Substrate: 1"x1" x 0.5 mm, two sides polished - McMo252505S2Poly Orientation 111A

Mo Polycrystalline Substrate: 1"x1" x 0.5 mm, two sides polished - McMo252505S2Poly Orientation 111APolycrystallline Mo substrate Purity: 99. 9% Average Grain Size: 10~50 Microns ( No annealing ) Substrate dimension: 1"x1" x 0. 5 mm Polishing: two sides polished Related Product Metallic Substrate A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater

Dual micrometer heads are included for knife blade adjustment and the operator can set the blade clearance by adjusting the digital micrometers

& Impurity

Chips will have passivation layer

Melting Point:                   1730 oC

Lib-LLC exhibits high lithium-ion conductivity and is primarily used in the manufacturing of solid-state lithium batteries

7    or    ( La0

wafer InGaAs EPI on InP (Semi-insulating)(100) by MOCVD deposition

Handle on both sides for easy carry

which is consumable

YLJ-HP2-H is an ecnomic hydraulic press with 12mm I

An optional tube rack for 15ml x 16 centrifuge tubes is available at extra cost

It is an ideal tool for applications where a dry and oil-free vacuum is required